Focused ion beam (FIB)
Focused ion beam
Focused ion beam, also known as FIB, is a technique used particularly in the semiconductor industry, materials science and increasingly in the biological field for site-specific analysis, deposition, and ablation of materials. A FIB setup is a scientific instrument that resembles a scanning electron microscope (SEM). However, while the SEM uses a focused beam of electrons to image the sample in the chamber, a FIB setup uses a focused beam of ions instead. FIB can also be incorporated in a system with both electron and ion beam columns, allowing the same feature to be investigated using either of the beams. FIB should not be confused with using a beam of focused ions for direct write lithography (such as in proton beam writing). These are generally quite different systems where the material is modified by other mechanisms.
Read more about 'Focused ion beam' at: WikipediaWikipedia contributors. "Focused ion beam." Wikipedia, The Free Encyclopedia. Wikipedia, The Free Encyclopedia, March 3, 2024.
Other modalities related to Focused ion beam in Helmholtz Imaging CONNECT:
In-situ and operando TEM provides a direct link between structural evolution and materials properties or function and the ability to identify transient structures, which cannot be observed ex-situ.
See also:
KIT on In situ EM
