The Zeiss Auriga 60 Dual Beam FIB is a combination of a scanning electron microscope (SEM) and a focused ion beam (FIB) system, which allows imaging and structuring of materials at the nanoscale. It is a DualBeam FIB with EDX, EBSD and vacuum transfer system.

It is equipped with an Omniprobe micromanipulator, an EDAX EDX and EBSD system, a vacuum transfer holder and electrical feed-throughs for in-situ experiments

##Configuration

• Operation Voltage:
  
  
  
  • High Tension SEM: 200 V - 30 kV
  
  
  • High Tension FIB: 0.2 kV - 30 kV
  
  
  
  


• Source
  
  
  
  • FEG (Schottky)
  
  
  • Gallium Liquid Metal Ion Source
  
  
  
  


• Imaging Detectors:
  
  
  
  • In-lens SE, SESI, EsB, 4QBSD
  
  
  • STEM detector
  
  
  
  


• Spectroscopy
  
  
  
  • EDAX EDX detector
  
  
  
  


• Diffraction
  
  
  
  • EDAX EBSD detector
  
  
  
  


• Gas Injection System (GIS)
  
  
  
  • C, Pt, and Si
  
  
  • XeF2 for selective etch enhancing
  
  
  • Gas injection for charge compensation
  
  
  
  


• Manipulators
  
  
  
  • Omniprobe 400 with independent x,y, z motion and rotation
  
  
  
  


• Transfer System
  
  
  
  • High-vacuum transfer system compatible with glove box and UHV deposition system
  
  
  
  

##Resolution

###30 kV

Electron Beam [nm]: 1.0

Gallium Ion Beam [nm] : 2.5

###15 kV

Electron Beam [nm]: 1.0

###1 kV

Electron Beam [nm]: 1.9

##Imaging, Analysis and Sample Preparation Techniques

• SE & BSE SEM analysis


• STEM imaging


• EDX analysis


• EBSD analysis


• 3D Slice & View tomography


• TEM sample preparation


• Nanoscale deposition and contacting