Tescan Solaris X DualBeam FIB equipped with Omniprobe micromanipulator and option for 3D Slice&View and TEM sample preparation.

The Tescan Solaris X, is a combination of a scanning electron microscope (SEM) and a focused ion beam (FIB) system, which allows imaging and structuring of materials at the nanoscale.

Configuration

• Operation Voltage:
  
  
  
  • High Tension SEM: 200 V - 30 kV
  
  
  • High Tension FIB: 3 kV - 30 kV
  
  
  
  


• Source
  
  
  
  • FEG (Schottky)
  
  
  • Xenon Plasma Source
  
  
  
  


• Imaging Detectors:
  
  
  
  • InBeam SE, (energy filtered) BSE, mid-angle BSE
  
  
  • Retractable LBSE detector
  
  
  • Retractable STEM detector
  
  
  
  


• Gas Injection System (GIS)
  
  
  
  • Multi-GIS (W, Pt, XeF2, C)
  
  
  
  


• Manipulators
  
  
  
  • Omniprobe 400 with independent x,y, z motion and rotation
  
  
  
  

##Resolution

###30 kV

Electron Beam [nm]: 0.5

Gallium Ion Beam [nm]: 12

###15 kV

Electron Beam [nm]: 0.6

###1 kV

Electron Beam [nm]: 1.2

##Imaging, Analysis and Sample Preparation Techniques

• SE & BSE SEM analysis


• STEM imaging


• 3D Slice & View tomography


• TEM sample preparation


• Nanoscale deposition and contacting