Tescan Solaris X DualBeam FIB equipped with Omniprobe micromanipulator and option for 3D Slice&View and TEM sample preparation.
The Tescan Solaris X, is a combination of a scanning electron microscope (SEM) and a focused ion beam (FIB) system, which allows imaging and structuring of materials at the nanoscale.

Configuration

• Operation Voltage:
  • High Tension SEM: 200 V - 30 kV
  • High Tension FIB: 3 kV - 30 kV
• Source
  • FEG (Schottky)
  • Xenon Plasma Source
• Imaging Detectors:
  • InBeam SE, (energy filtered) BSE, mid-angle BSE
  • Retractable LBSE detector
  • Retractable STEM detector
• Gas Injection System (GIS)
  • Multi-GIS (W, Pt, XeF2, C)
• Manipulators
  • Omniprobe 400 with independent x,y, z motion and rotation

Resolution

30 kV

Electron Beam [nm]: 0.5

Gallium Ion Beam [nm]: 12

15 kV

Electron Beam [nm]: 0.6

1 kV

Electron Beam [nm]: 1.2

Imaging, Analysis and Sample Preparation Techniques

• SE & BSE SEM analysis
• STEM imaging
• 3D Slice & View tomography
• TEM sample preparation
• Nanoscale deposition and contacting